MECENG 203
Nanoscale Processing of Materials
This course surveys sub-micrometer pattern-transfer techniques and methods for handling materials with one or more sub-micrometer dimensions. The optical and mechanical principles underlying a spectrum of candidate lithography techniques are introduced, and extensive examples of industrial applications are discussed. Class material also covers techniques for assembling structures from zero-, one- and two-dimensional materials including nanoparticles, nanotubes, nanowires, and single- and few-atomic-layer sheets of van der Waals solids such as graphene and molybdenite.
Topics
- The objectives of the course are to: • Make students aware of current capabilities and innovations in sub-micrometer lithography and in the handling of nanoscale materials; • Equip students to select an appropriate lithography or processing technique for a given application from among multiple alternatives; • Provide students with an understanding of the transformations of material that occur in sub-micrometer lithography techniques, such that they can understand why certain processing routes might be preferable to others for particular applications.
- • Articulate the key requirements (i.e. resolution, maximum defect density, and multi-layer alignment precision) of micro- and nano-patterning processes to be used in a range of applications, such as semiconductors, hard disk-drives, large-area photovoltaics, and biomedical microdevices. • Identify which of a set of available micro-/nano-patterning processes (e.g. extreme-UV lithography, directed self-assembly, multiple e-beam lithography, and imprint lithography) are suitable for a given patterning application. • Accurately explain and distinguish between the physical transformations of material that occur in a number of sub-micrometer patterning processes, including imprint lithography, micro-contact printing, micro-embossing, and micro-gravure. • Identify a number of currently open research questions relating to nanoscale processing of materials and suggest possible creative solutions to them. • Use numerical simulation techniques to model the behavior of one or more lithographic techniques, including nanoimprint, photolithography, or electron-beam lithography. Use insights from modeling to optimize key process parameters and to make trade-offs in the geometrical design of a pattern that is to be fabricated.
Official catalogue course objectives and student learning outcomes
Sources
- Course catalogue ↗2026-2027