ENEE 416
Integrated Circuit Fabrication Laboratory
Characterization of wafers and fabrication steps. Oxide growth, lithography, dopant diffusion, and metal deposition and patterning will be discussed in the lectures and carried out in the lab in fabricating NMOS transistor circuits. The transistor characteristics will be measured and related to the fabrication parameters.
Prerequisites & course information
Prerequisite: Minimum grade of C- in ENEE303 or ENEE304 ; and must have earned a minimum grade of regular (letter) C- in all required 200-level ENEE courses. Restriction: Must be in one of the following programs (Engineering: Computer; Engineering: Electrical), and permission of ENGR-Electrical & Computer Engineering department.
Sources
- Course catalogue ↗2026-2027
- Catalogue entry ↗
Catalogue variants
- Integrated Circuit Fabrication Laboratory · 3 Credits