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ECE 340P

High-Throughput Nanopatterning

3 Hours

Explore sub-50nm fabrication using mechanical patterning techniques; overview of photolithography, mechanical nanopatterning processes, hot embossing, and UV imprint lithography; wafer-scale and roll-to-roll nanopatterning with applications in electronics, photonics, and nanomedicine; physics of nanoreplication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput. Only one of the following may be counted: Electrical and Computer Engineering 340P, Electrical Engineering 340P, 379K (Topic: High Throughput Nanopatterning), Mechanical Engineering 379M (Topic: High Throughput Nanopatterning). Three lecture hours a week for one semester.

Prerequisites & course information

Explore sub-50nm fabrication using mechanical patterning techniques; overview of photolithography, mechanical nanopatterning processes, hot embossing, and UV imprint lithography; wafer-scale and roll-to-roll nanopatterning with applications in electronics, photonics, and nanomedicine; physics of nanoreplication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput. Only one of the following may be counted: Electrical and Computer Engineering 340P, Electrical Engineering 340P, 379K (Topic: High Throughput Nanopatterning), Mechanical Engineering 379M (Topic: High Throughput Nanopatterning). Three lecture hours a week for one semester.

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