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ECE 396K.19

Plasma Processing of Semiconductors I

3 Hours

Explore plasma analysis using Boltzmann and fluid equations; plasma properties, including Debye length, quasineutrality, and sheaths; basic collisional properties, including Coulomb and polarization scattering; analysis of capacitive and wave-heated plasma processing reactors. Electrical and Computer Engineering 396K (Topic 19) and Electrical Engineering 396K (Topic 19) may not both be counted.

Prerequisites & course information

Explore plasma analysis using Boltzmann and fluid equations; plasma properties, including Debye length, quasineutrality, and sheaths; basic collisional properties, including Coulomb and polarization scattering; analysis of capacitive and wave-heated plasma processing reactors. Electrical and Computer Engineering 396K (Topic 19) and Electrical Engineering 396K (Topic 19) may not both be counted.

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