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M E 386S.2

Metallization and Packaging

3 Hours

Technology requirements and trends, impact of device scaling, multilayered interconnect structures, Schottky and ohmic contacts, contact reactions, silicide properties and applications, electromigration, thermal/mechanical properties, reliability.

Prerequisites & course information

Technology requirements and trends, impact of device scaling, multilayered interconnect structures, Schottky and ohmic contacts, contact reactions, silicide properties and applications, electromigration, thermal/mechanical properties, reliability.

Sources