M E 386S.2
Metallization and Packaging
Technology requirements and trends, impact of device scaling, multilayered interconnect structures, Schottky and ohmic contacts, contact reactions, silicide properties and applications, electromigration, thermal/mechanical properties, reliability.
Prerequisites & course information
Technology requirements and trends, impact of device scaling, multilayered interconnect structures, Schottky and ohmic contacts, contact reactions, silicide properties and applications, electromigration, thermal/mechanical properties, reliability.
Sources
- Course catalogue ↗2026-2027