Fundamentals of Integrated Circuit Technology

3 credits

Processing physics, chemistry, and technology, including evaporation, sputtering, epitaxial growth, diffusion, ion implantation, laser annealing, oxidation, chemical vapor deposition, photoresists. Design considerations for bipolar and MOS devices, materials and process characterization. Future trends. Prerequisite: EE 331 or MSE 351. Offered: jointly with MSE 486; AW.