INTEGRATED CIRCUIT FABRICATION LABORATORY

Prerequisites & course information

Requisites: ( E C E 335 or 548 ), graduate/professional standing, or member of Engineering Guest Students Course Designation: Grad 50% - Counts toward 50% graduate coursework requirement Repeatable for Credit: No Last Taught: Spring 2026 Learning Outcomes: 1. Analyze, design and execute process flow used during semiconductor device fabrication Audience: Both Grad & Undergrad 2. Perform simple electrical measurements of MOSFET transistors Audience: Both Grad & Undergrad 3. Explain operating principles of clean room tools such as mask aligner, plasma etcher, metal deposition sputterer, etc. Audience: Both Grad & Undergrad 4. Perform silicon processing steps in the clean room such as lithography, wet and dry etching, and metal deposition Audience: Both Grad & Undergrad 5. Solve engineering problems related to silicon processing Audience: Both Grad & Undergrad 6. Design and perform advanced electrical measurements of MOSFET devices Audience: Graduate Learning Outcomes: 1. Analyze, design and execute process flow used during semiconductor device fabrication Audience: Both Grad & Undergrad 2. Perform simple electrical measurements of MOSFET transistors Audience: Both Grad & Undergrad 3. Explain operating principles of clean room tools such as mask aligner, plasma etcher, metal deposition sputterer, etc. Audience: Both Grad & Undergrad 4. Perform silicon processing steps in the clean room such as lithography, wet and dry etching, and metal deposition Audience: Both Grad & Undergrad 5. Solve engineering problems related to silicon processing Audience: Both Grad & Undergrad 6. Design and perform advanced electrical measurements of MOSFET devices Audience: Graduate